Russia has announced a roadmap to develop its own EUV (Extreme Ultraviolet) lithography tools, aiming to produce devices that are cheaper and more complex than those of ASML. These machines will utilize a wavelength of 11.2 nanometers, which is different from the standard 13.5 nanometers used by ASML. This change requires Russia to develop its own EUV ecosystem, which is a massive undertaking that may take several years or even a decade. The project will be progressed in three stages, ultimately achieving the capability of processing 60 300mm wafers per hour.
Source: Tom's Hardware