Russia has made a bold move in the highly competitive semiconductor industry by unveiling its own EUV (Extreme Ultraviolet) lithography roadmap. This ambitious plan, led by the Russian Academy of Sciences'微结构物理研究所 Microstructure Physics Institute, promises to challenge the dominance of Dutch company ASML in the field.
The Russian roadmap focuses on an innovative 11.2 nanometer wavelength laser technology, a significant departure from the industry standard 13.5 nanometers used by ASML. This technology is not only more efficient but also potentially more cost-effective. However, it's worth noting that adopting and perfecting this technology will take several years, if not decades.
INSIDE, a popular technology website, has reported on this story and highlights the potential implications of Russia's move.
While it's true that even technically advanced countries like the US and Japan have struggled to match ASML's capabilities, Russia's decision to pursue EUV lithography reflects its determination to assert its technological independence in the semiconductor industry. Time will tell if this ambitious plan will bear fruit.